October 9-12, 2017
Raleigh, NC
October 9-12, 2017
Raleigh, NC
Attend our joint paper with SUSS MicroTec
Ablative Laser Patterning of Polymeric Dielectric Materials
Author(s): Cristina Matos, Brewer Science, Inc. (Deborah Blumenshine, Lisa Kirchner, Rama Puligadda; Brewer Science, Inc.; Habib Hichri, Seongkuk Lee, Markus Arendt, Suss MicroTec Group)
Wednesday, October 11, 2017, 8:30-8:55 am
Abstract: Advances in the research and development of dielectric materials has facilitated the advancement of electronic devices. With these advancements, certain performance specifications need to be met as these devices become more compact and efficient. Current methods for meeting these challenges present problems of their own and new generations of materials with increased performance are necessary to meet the needs of newer applications.
About IMAPS 2017:
IMAPS Raleigh is the LARGEST Conference Program for Microelectronics, Assembly, Reliability, Emerging Applications, Materials & Advanced Packaging in the FALL of 2017.
Schedule a time to meet at the conference or ask a question about a featured product:
