November 11-13, 2018
Sapporo, Japan
November 11-13, 2018
Sapporo Park Hotel
Sapporo, Japan
Brewer Science will attend the 4th International Symposium on DSA in Sapporo, Japan. Directed self-assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. The 4th International Symposium on DSA will be organized as a collaborative effort between EIDEC, imec, CEA-Leti, and NIST. See what Brewer Science has to say about DSA and view our product offerings here and read up on our latest blog, “From The Bottom Up: Making More Room With Selective Surface Modification.”
To learn more about DSA 2018, visit the website here and check back periodically on our events page for more information on upcoming conferences. You can also follow us on follow us on Twitter, Facebook and LinkedIn to see the latest industry insights, articles and blogs.
