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New developments in underlayers play key role in advanced EUV lithography Rolla, Mo.– April 11, 2023 – Brewer Science, Inc., a global leader in developing and manufacturing next-generation materials for the microelectronics and optoelectronics industries, will present New Developments in Underlayers and Their Role in Advancing EUV Lithography at Critical Materials Council (CMC) Conference. Demand…
Click Here to Read MoreBrewer Science will be presenting at the 2023 SPIE Advanced Lithography + Patterning in San Jose, California February 26th - March 2nd. Dr. Si Li, Senior Research Associate of R&D- Emerging Materials, will present Novel assist layer to enhance EUV lithography performance of photoresists on different substrate, on February 28th at 3:40pmPST in Grand Ballroom…
Click Here to Read MoreInternational Microprocesses and Nanotechnology Conference (MNC 2022) Dr. Douglas Guerrero will present, Patterning Concepts Using Ultrathin Layers in Symposium A: Emerging Breakthroughs in Materials, Processes and Equipment for Advanced Lithography (Litho Breakthrough Symposium) at The 35th International Microprocesses and Nanotechnology Conference (MNC 2022) in Tokushima, Japan on November 8th through 11th. Dr. Guerrero's presentation will…
Click Here to Read MoreFebruary 25 – March 2, 2018 Booth #: 110 San Jose Convention Center San Jose, California Speaker Information: Presenter: Zhimin Zhu Time: Tuesday, February 27th: 10:30AM – 12:10PM Optical Microlithography Session 2: Advanced Process Control Paper #: 10587-5 Title: High-fidelity lithography against stochastic effects Poster: Nicholas L. Brakensiek, Kui Xu, and Daniel Sweat Time:…
Click Here to Read MoreFebruary 28- March 2, 2017 San Jose, California Booth: 110 Molecular force modeling of lithography - Invited Paper Zhimin Zhu, Brewer Science, Inc. (United States) Session 4: 3D Resist Effects and Modeling Tuesday, February 28th 2017 4:10 - 6:00 PM Location: Convention Center 220C Highχ block copolymers for directed self-assembly patterning without the need for…
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